配方类型:

COSMETICS

配方说明:

After Sun Lotion

配方组成:

Water/61.5
PEG 1000 Monostearate/3.0
B: "Amerchol" L101/5.0
C: Triethanolamine/0.5
A: "Carbopol" 940/0.5
Ethanol SDA 40 (95%)/26.0
"Ceraphyl" 140/3.5

配制方法:

Make "Carbopol" slurry in advance. Add B to A at 75'C. Cool with agitation to 50'C. Add C slowly with agitation.